JJAP : Japanese Journal of Applied Physics
ISSN Online: 1347-4065 / Print: 0021-4922
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Invited Review Papers

+Volume 52 (2013)
+Volume 51 (2012)
+Volume 49 (2010)
+Volume 48 (2009)
+Volume 47 (2008)
+Volume 46 (2007)
+Volume 45 (2006)
+Volume 44 (2005)
+Volume 43 (2004)
+Volume 42 (2003)
+Volume 39 (2000)
+Volume 38 (1999)
+Volume 37 (1998)
+Volume 36 (1997)
+Volume 35 (1996)
+Volume 34 (1995)
+Volume 33 (1994)
+Volume 32 (1993)
+Volume 31 (1992)
+Volume 26 (1987)
+Volume 25 (1986)
+Volume 24 (1985)
+Volume 23 (1984)
+Volume 22 (1983)
+Volume 21 (1982)
+Volume 20 (1981)
+Volume 19 (1980)
+Volume 17 (1978)
+Volume 16 (1977)
+Volume 15 (1976)

Volume 39 (2000)

  • Effects of Discharge Frequency in Plasma Etching and Ultrahigh-Frequency Plasma Source for High-Performance Etching for Ultralarge-Scale Integrated Circuits
    Seiji Samukawa, Vincent M. Donnelly and Mikhail V. Malyshev
    Jpn. J. Appl. Phys. 39 (2000) 1583
  • Prospects and Problems of Single Molecule Information Devices
    Yasuo Wada, Masaru Tsukada, Masamichi Fujihira, Kazumi Matsushige, Takuji Ogawa, Masaaki Haga and Shoji Tanaka
    Jpn. J. Appl. Phys. 39 (2000) 3835
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