JJAP : Japanese Journal of Applied Physics
ISSN Online: 1347-4065 / Print: 0021-4922
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Invited Review Papers

+Volume 52 (2013)
+Volume 51 (2012)
+Volume 49 (2010)
+Volume 48 (2009)
+Volume 47 (2008)
+Volume 46 (2007)
+Volume 45 (2006)
+Volume 44 (2005)
+Volume 43 (2004)
+Volume 42 (2003)
+Volume 39 (2000)
+Volume 38 (1999)
+Volume 37 (1998)
+Volume 36 (1997)
+Volume 35 (1996)
+Volume 34 (1995)
+Volume 33 (1994)
+Volume 32 (1993)
+Volume 31 (1992)
+Volume 26 (1987)
+Volume 25 (1986)
+Volume 24 (1985)
+Volume 23 (1984)
+Volume 22 (1983)
+Volume 21 (1982)
+Volume 20 (1981)
+Volume 19 (1980)
+Volume 17 (1978)
+Volume 16 (1977)
+Volume 15 (1976)

Volume 37 (1998)

  • Chlorine-Based Dry Etching of III/V Compound Semiconductors for Optoelectronic Application
    Kiyoshi Asakawa, Takashi Yoshikawa, Shigeru Kohmoto, Yoshihiro Nambu and Yoshimasa Sugimoto
    Jpn. J. Appl. Phys. 37 (1998) 373
  • Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method
    Hideki Matsumura
    Jpn. J. Appl. Phys. 37 (1998) 3175
  • Overview of Silicon-Based Materials
    Nobuo Matsumoto
    Jpn. J. Appl. Phys. 37 (1998) 5425
  • Superconducting Radiation Detectors and Their Future Perspectives
    Hans Kraus
    Jpn. J. Appl. Phys. 37 (1998) 6273
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